Custom MBE Systems

Virtually unlimited thin film growth techniques.

Combined UHV SPM / XPS / UPS / MBE system

Powerful in-situ characterisation during vacuum processing
• High resolution variable temperature microscopy and spectroscopy
• Organic thin fi lm growth under well controlled conditions
• Electronic and spatial investigations of new materials for solar energy applications


Hybrid (PLD) Laser-MBE System (based on a LAB10 MBE System)

The customized LAB-10 Laser-MBE System is equipped with a preparation chamber for sample pre-treatment (e.g. sputtering or heating) and a loadlock for fast sample introduction. Two target stages for ablation of materials with a laser have been added as additional functionality.

Standard Omicron samples can be used for both the MBE deposition process as well as the PLD process or even simultaneously and at high temperatures. In addition to the two PLD targets, up to seven deposition sources can be attached to the growth chamber, including for example an Arsenic cracker source, effusion cells or organic material sources. In-situ growth control is realized using a differentially pumped High-Pressure RHEED system.



The combination of a MULTIPROBE Compact System with a PLD preparation chamber allows in-situ studies of the electronic and physical structure of epitaxially grown binary and complex oxide-surfaces and interfaces, for example perovskites such as LaAlO3, SrTiO3, LaMnO3. The analysis chamber for structural analysis of the samples is equipped with a variable temperature STM with QPlus® AFM sensor. The SPHERA U5 Electron Analyser and the DAR400 Dual Anode X-Ray source allow for the analysis of the electronic structure of the films.

The PLD chamber is equipped with a sample manipulator which is able to run in an oxygen-rich environment, a target stage with up to 5 targets and a high pressure RHEED which allows for in-situ characterisation of the grown films.


Charge & spin transport in graphene layers on 2 inch substrates

A new MBE system which allows experiments related to graphene heterostructures or nanoscale ferromagnets. Graphene hydrogenation after contacts are formed with a stencil mask in the main deposition chamber and the main deposition chamber itself. This chamber is equipped with a sample heater and a hydrogen source. Furthermore a second satellite chamber is being configured to allow in-situ-magneto-transport measurements. For more details please see Pico 2011.


III-V MBE system for film growth on 4 inch wafers

PRO-100 III-V MBE system for high-end quality film growth on 4" wafers. The system is equipped with effusion cells for Gallium, Indium, Aluminium, a valved Arsenic cracker source, doping sources, RHEED, beam flux monitor and EPI-Soft process control software. For additional information please see Pico 2010.


III-N MBE system for 3 inch substrates with additional in situ VT SPM

State-of-the-Art PRO-75 III-N MBE system for 3" sized substrates with an additional in situ VT SPM directly attached. It is equipped with various effusion cells and doping sources for III-V materials growth, RHEED, beam flux monitor and EPI-Soft software. For additional information please see Pico 2010.


MBE & Catalysis

The analysis system for Catalysis Research is equipped with various surface analysis and sample preparation techniques Integrated surface spectroscopy methods are: XPS and PAX (photoemission from adsorbed Xenon) @ 50 K, UPS and LEED for quantitative chemical and structural analysis of solid surfaces and probe of local electronic structure.

Raman spectroscopy is used to identify surface species and their bonding @ up to 1 bar (atmosphere) pressure. The system is also equipped with an Electron Paramagnetic Resonance spectroscopy (EPR) @ up to 1 bar and a cyclic voltametry (CV) and electrochemistry in aqueous conditions.

The VT-STM/AFM is used for structural and compositional sample analysis. The integrated molecular beam reactor is used to measure sticking probabilities and the time evolution of surface chemical reactions.